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Kin Wah Chow

Principal

Jakarta

+62 21 5080 8157

Biography

Kin Wah is a Principal and registered foreign lawyer with Suryomurcito & Co – a Rouse network firm for all activities reserved to Indonesian lawyers. He is also a Principal at Rouse.

He handles predominantly dispute resolution and enforcement matters.

Kin Wah brings to the firm a strong international experience in relation to both contentious and non-contentious IP matters after working for a long time in China, Hong Kong SAR, and Singapore.  He regularly advises local and foreign clients on matters related to patent infringements, trade mark infringements, software contract disputes, and patent and trade mark oppositions. He also uses his experience to create a difference. Some of his publications are a testimony to that. He is also the Chairperson of EUROCHAM Indonesia IPR working group and is often invited by International associations to discuss the IP landscape in Indonesia and Southeast Asia.

Qualifications

  • National University of Singapore, Bachelor of Law, 1992
  • Supreme Court of Republic of Singapore, Advocate & Solicitor, 1993
  • Registered Foreign Lawyer, Indonesia
  • Western Australia Supreme Court, Solicitor & Barrister
  • Solicitor, England & Wales
  • Attorney-at-Law, New York, United States of America

Memberships

  • EuroCham Indonesia - Head of IPR Working Group

Awards

  • WTR 1000: Silver - Prosecution and Strategy, Silver - Enforcement and Litigation, Recommended - Licensing and Transactions (2024), Leading Individual & Recommended for Notable Work (2019-2020), Leading Individual (2015-2016)
  • Chambers & Partners: Notable Practitioner (2016, 2018-2023)
  • Chambers Asia Pacific: Spotlight (2023), Notable Practitioner, and ranked as Foreign Legal Consultant (2016-2017)
  • Legal 500: Practice Head (2022-2023), Key Lawyer in Tier 1 (2020), and Recommended Individual (2015)
  • IAM Patent: Recommended Individual (2020)
  • Who's Who Legal Patents:  Nominated among Indonesian Lawyers (2020)
  • MIP IP Stars: Recognized for Notable Work (2019)